industrial production the sindre® / / nano imprint lithography (nil) systems are designed for fully automated high volume production, using obducat's proprietary ips®/stu® process. cost efficiency and contamination control is obtained through hands-off operation and a sophisticated cassette-to-cassette...
preconfigured laser markers laser marking systems add-on components manual welding lasers desktop performance select integral laser systems laser welding systems manual welding lasers laser cutting systems laser marking systems multi-purpose systems web material processing needle drill system laser systems for...
(such as chemical vapor deposition ), and etching . the main process steps are supplemented by doping and cleaning. more recent or high-performance ics may instead use multi-gate finfet or gaafet transistors instead of planar ones. mono-crystal silicon wafers are used in most applications (or for special...
(such as chemical vapor deposition ), and etching . the main process steps are supplemented by doping and cleaning. more recent or high-performance ics may instead use multi-gate finfet or gaafet transistors instead of planar ones. mono-crystal silicon wafers are used in most applications (or for special...